The MBI Colloquium, held on December 17, 2024, at the Max Born Institute in Berlin, will feature Dr. Wim van der Zande from the Advanced Research Center for NanoLithography (ARCNL). This event focuses on the intersection of fundamental physics and advanced semiconductor manufacturing technologies, particularly through the lens of ASML’s innovative lithographic machines. ARCNL, founded in 2014 with ASML’s initiative, enhances the development of cutting-edge nanolithography tools essential for creating high-performance chips. Dr. van der Zande’s presentation will discuss the scientific challenges faced by ARCNL and their relevance to ASML’s tools, emphasizing how bridging academic research and industry can accelerate the advancement of chip technology and address complex physical and chemical challenges. The colloquium not only highlights the significance of public-private partnerships in technological development but also aims to inspire further exploration of fundamental research’s role in practical applications.
The upcoming MBI Colloquium is vital for professionals in the fields of physics and semiconductor technology. Dr. Wim van der Zande’s insights will illuminate how ARCNL’s research contributes directly to advancements in nanolithography tools. The collaboration between academia and industry epitomized by ARCNL and ASML plays a crucial role in overcoming the scientific obstacles inherent in chip manufacturing, pushing the boundaries of technology forward. This event represents an opportunity to engage with pioneering ideas at the forefront of technology.
